Deposition of semiconductor array on metal oxide films

The Challenge/Concern:

A technique was desired for deposition of semiconductor quantum dots on metal oxide substrate. 

Brief (and non-confidential) Solution

Techniques of self-assembled monolayer and chemical bath deposition were concerned and optimized for the materials of interest. Control on size of the dots, the coverage ratio and aspect ratio was optimized. A hybrid of both techniques was concluded based on the optimization. Performance of the hybrid technique was tested according to the success criteria.

Service / Project: Complete Consultation

16 thoughts on “Deposition of semiconductor array on metal oxide films”

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